Direct-write polymer nanolithography in ultra-high vacuum

• Woo-Kyung Lee,
• Minchul Yang,
• Arnaldo R. Laracuente,
• William P. King,
• Lloyd J. Whitman and
• Paul E. Sheehan

Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6

• , whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface. Keywords: additive lithography; polymer; scanning probe lithography; ultra high vacuum; Introduction The deposition of materials in vacuum is the foundational technology for creating modern electronic

• vacuum (UHV), to be used effectively. While the suite of established vacuum deposition technologies is vast and capable of highly precise deposition, there are relatively few methods to perform additive lithography in a single deposition step. Additive lithography deposits only the material that is

• -contact printing [4] have been limited to deposition under ambient pressures, and therefore cannot achieve the benefits of the controlled environment under vacuum. One type of additive lithography is scanning probe lithography (SPL) where sharp probes either guide the deposition of material to a substrate